Thermal spray material, thermal spray coating and thermal spray coated article

ABSTRACT

This invention provides a thermal spray material capable of forming a thermal spray coating excellent in plasma erosion resistance as well as in properties such as porosity and hardness. The thermal spray material comprises a rare earth element oxyhalide (RE-O—X) which comprises a rare earth element (RE), oxygen (O) and a halogen atom (X) as its elemental constituents. The rare earth element oxyhalide has a halogen to rare earth element molar ratio (X/RE) of 1.1 or greater.

CROSS-REFERENCE

The present application claims priority to Japanese Patent Application No. 2015-095517 filed on May 8, 2015 and Japanese Patent Application No. 2016-043941 filed on Mar. 7, 2016. The entire contents of these applications are incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a thermal spray material, a thermal spray coating formed with the thermal spray material, and a thermal spray coated article.

2. Description of the Related Art

Technologies to coat substrate surfaces with various materials to add new functionalities have been conventionally used in various fields. One known example of such surface coating technologies is thermal spray technology where a substrate surface is thermal-sprayed with particles formed with a material such as ceramic softened or melted by combustion or electrical energy, thereby to form a thermal spray coating made of the material.

In industries of manufacturing semiconductor devices and the like, generally, the surfaces of semiconductor substrates are very finely processed by dry etching with plasma of a halogen gas such as fluorine, chlorine and bromine. After the dry etching process, the chamber (vacuum container) from which the semiconductor substrates have been removed are cleaned with oxygen gas plasma. During this, in the chamber, there are possibilities of erosion occurring on members exposed to the highly reactive oxygen gas plasma or halogen gas plasma. If the erosion areas fall as particles from these members, these particles may be deposited on the semiconductor substrates, becoming contaminants (or “particles” hereinafter) to cause circuit defects.

Thus, conventionally, in equipment for manufacturing semiconductor devices, to reduce the formation of particles, members exposed to plasma of oxygen gas, halogen gases and the like are provided with a thermal spray ceramic coating with plasma erosion resistance. For instance, International Application Publication No. 2014/002580 teaches that by using granules that comprise an yttrium oxyfluoride at least partially as the thermal spray material, a thermal spray coating can be formed with high resistance to plasma erosion.

SUMMARY OF THE INVENTION

With increasing degrees of integration of semiconductor devices, more precise management of particle contamination is required. Greater plasma erosion resistance is thus required also from thermal spray ceramic coatings provided to equipment for manufacturing semiconductor devices. For thermal spray coatings, favorable properties such as porosity and hardness are also preferred, for instance, in view of obtaining great durability, etc.

In view of these circumstances, an objective of this invention is to provide a thermal spray material capable of forming a thermal spray coating having greater plasma erosion resistance as well as other great properties such as hardness with a low porosity. Other objectives are to provide a thermal spray coating and a thermal spray coated article fabricated with the thermal spray material.

As a solution to the problem, this invention provides a thermal spray material having the following characteristics. In particular, the thermal spray material disclosed herein is characterized by: comprising a rare earth element oxyhalide (RE-O—X) which comprises a rare earth element (RE), oxygen (O) and a halogen atom (X) as its elemental constituents; and by the rare earth element oxyhalide having a halogen to rare earth element molar ratio (X/RE) of 1.1 or greater. The molar ratio (X/RE) is more preferably 1.3 or greater, but 1.39 or less.

According to studies by the present inventors, a thermal spray material comprising a rare earth element oxyhalide can form a thermal spray coating with superior erosion resistance against halogen plasma as compared to a thermal spray material comprising a rare earth element oxide, a rare earth element halide, etc. It has been found that the rare earth element oxyhalide preferably has a halogen to rare earth element molar ratio (atomic ratio) of 1.1 or greater, or even 1.3 or greater, but 1.39 or less, in order to form a thermal spray coating that has particularly great plasma erosion resistance while being excellent in properties such as porosity and hardness.

It is noted that Patent Document 1 discloses thermal spray materials comprising yttrium oxyfluoride (YOF). However, it is silent about a thermal spray material that comprises a rare earth element oxyhalide to further increase the plasma erosion resistance, etc., with the halogen to rare earth element molar ratio being as described above. That is, the thermal spray material disclosed herein is a novel thermal spray material that can form a thermal spray coating great in plasma erosion resistance as well as in other great properties such as porosity and hardness.

In a preferable embodiment, the thermal spray material disclosed herein is further characterized by comprising a rare earth element halide, with the rare earth element halide accounting for 23% or more of the total mass.

With respect to the thermal spray material disclosed herein, because the inclusion of the rare earth element oxyhalide has a halogen to rare earth element molar ratio as described above, the resulting thermal spray coating has increased plasma erosion resistance. Thus, with respect to a rare earth element halide that can decrease the plasma erosion resistance when present in the thermal spray coating, it can be included, for instance, up to the aforementioned percentage.

In a preferable embodiment, the thermal spray material disclosed herein may be essentially free of the rare earth element halide. It can also be in an embodiment essentially free of the rare earth element oxide.

Such an embodiment can provide a thermal spray material capable of increasing the plasma erosion resistance of the resulting thermal spray coating while decreasing the porosity and increasing the hardness of the thermal spray coating.

In a preferable embodiment, the thermal spray material disclosed herein is characterized by the rare earth element being yttrium, the halogen being fluorine, and the rare earth element oxyhalide being an yttrium oxyfluoride. Such an embodiment provides, for instance, a thermal spray material capable of forming a thermal spray coating with excellent erosion resistance especially to fluorine plasma.

In another aspect, the present invention provides a thermal spray coating that is a thermal spray deposit of an aforementioned thermal spray material (a thermal spray coating formed from a thermal spray material disclosed herein). The rare earth element oxide content in the thermal spray coating can embrittle the thermal spray coating to degrade the plasma resistance. The thermal spray coating disclosed herein is formed by thermal spraying of an aforementioned thermal spray material. Because its rare earth element oxide content is reduced, it is provided as a coating with surely greater plasma erosion resistance.

The thermal spray coating provided by this invention is characterized by: comprising a rare earth element oxyhalide (RE-O—X) which comprises a rare earth element (RE), oxygen (O) and a halogen atom (X) as its elemental constituents; and by the rare earth element oxyhalide having a halogen to rare earth element molar ratio (X/RE) of 1.1 or greater.

According to such a constitution, the thermal spray coating will have surely increased plasma erosion resistance because it includes the rare earth element oxyhalide which provides superior plasma erosion resistance. The thermal spray coating is provided also with improved, well-balanced porosity and hardness.

In a preferable embodiment, the thermal spray coating disclosed herein is characterized by being essentially free of an oxide of the rare earth element. It is preferable because the plasma erosion resistance is further increased when the thermal spray coating is essentially free of a rare earth element oxide.

In a preferable embodiment, the thermal spray coating disclosed herein is characterized by the rare earth element being yttrium, the halogen being fluorine, and the rare earth element oxyhalide being an yttrium oxyfluoride. Such an embodiment allows surely for formation of a thermal spray coating having great erosion resistance to, for instance, fluorine plasma and also having improved porosity, hardness, etc.

The thermal sprayed article provided by the art disclosed herein is characterized by having a substrate surface provided with an aforementioned thermal spray coating. According to such a configuration, the thermal sprayed article is provided with excellent plasma erosion resistance.

BRIEF DESCRIPTION OF THE DRAWING

For a better understanding of the invention as well as other objects and further features thereof, reference is had to the following detailed description to be read in connection with the accompanying drawing, wherein:

The single FIGURE shows X-ray diffraction spectra of thermal spray materials of (a) No. 5 and (b) No. 8 in Embodiment 2.

DETAILED DESCRIPTION OF THE INVENTION

Preferred embodiments of the present invention are described below. Matters necessary to practice this invention other than those specifically referred to in this description may be understood as design matters based on the conventional art in the pertinent field for a person of ordinary skill in the art. The present invention can be practiced based on the contents disclosed in this description and common technical knowledge in the subject field.

[Thermal Spray Material]

The thermal spray material disclosed herein comprises a rare earth element oxyhalide (RE-O—X) which comprises a rare earth element (RE), oxygen (O) and a halogen atom (X) as its elemental constituents. It is characterized by the rare earth element oxyhalide having a halogen to rare earth element molar ratio (X/RE) of 1.1 or greater.

In the art disclosed herein, the rare earth element (RE) is not particularly limited and can be suitably selected among elements including scandium, yttrium and lanthanides. In particular, it can be one species or a combination of two or more species among scandium (Sc), yttrium (Y), lanthanum (La), cerium (Ce), praseodymium (Pr), neodymium (Nd), promethium (Pm), samarium (Sm), europium (Eu), gadolinium (Gd), terbium (Tb), dysprosium (Dy), holmium (Ho), erbium (Er), thulium (Tm), ytterbium (Yb) and lutetium (Lu). From the standpoint of the improved plasma erosion resistance and costs, etc., preferable species include Y, La, Gd, Tb, Eu, Yb, Dy and Ce. The rare earth element may comprise solely one species among these, or two or more species in combination.

The halogen (X) is not particularly limited, either, and can be any of the elements of Group 17 of the periodic table. In particular, the halogen can be solely one species or a combination of two or more species among fluorine (F), chlorine (CD, bromine (Br), iodine (I) and astatine (At). It can preferably contain at least one of F, Cr, and Br. Typical examples of the rare earth element oxyhalide include oxyfluorides, oxychlorides and oxybromides of various rare earth elements.

In the art disclosed herein, the ratio of the rare earth element (RE) and halogen (X) constituting the rare earth element oxyhalide is adjusted so that the molar ratio (X/RE) is 1.1 or greater. In particular, for instance, the molar ratio (X/RE) is more preferably 1.2 or greater, or desirably 1.3 or greater. The upper limit of the molar ratio (X/RE) is not particularly limited and can be, for instance, 3 or less. In particular, the halogen to rare earth element ratio (X/RE) is more preferably 2 or less, or yet more preferably 1.4 or less (below 1.4). A favorable molar ratio (X/RE) is, for example, 1.3 or greater, but 1.39 or less (e.g. 1.32 or greater, but 1.36 or less). This is preferable because such a high halogen to rare earth element ratio brings about greater resistance to halogen plasma.

The oxygen to rare earth element molar ratio (O/RE) is not particularly limited. It can be selected in accordance with the molar ratio (X/RE). For example, favorably, the molar ratio (O/RE) can also be 1; it is preferably less than 1. In particular, for instance, it is more preferably 0.9 or less, or desirably 0.88 or less or even 0.86 or less. The lower limit of the molar ratio (O/RE) is not particularly limited, either. For instance, it can be 0.1 or greater. In particular, a favorable oxygen to rare earth element molar ratio (O/RE) is, for example, greater than 0.8, but less than 0.85 (preferably 0.81 or greater, but 0.84 or less). This is preferable because such a low oxygen to rare earth element ratio allows for inhibition of the formation of a rare earth element oxide (e.g. Y₂O₃) in the thermal spray coating caused by oxidation during the thermal spray process.

While it cannot be generalized as it is also related to the crystal structure of the rare earth element oxyhalide as well as the molar ratios (X/RE and O/RE), as a rough guide, the rare earth element oxyhalide can be, for instance, a compound having an arbitrary ratio of RE, O and X, represented by a general formula such as RE₁O_(m1)X_(m2) (e.g. 0.1≦m1≦1.2, 0.1≦m2≦3). A favorable embodiment is discussed now wherein the rare earth element is yttrium (Y), the halogen is fluorine (F), and the rare earth element oxyhalide is an yttrium oxyfluoride (Y—O—F). An example of the yttrium oxyfluoride is, for instance, a thermodynamically stable compound having a chemical composition represented by YOF having a Y:O:X ratio of 1:1:1. It can be a relatively thermodynamically stable species represented by a general formula Y₁O_(1-n)F_(1+2n) (in the formula, n satisfies, for instance, 0.12≦n≦0.22), such as Y₅O₄F₇, Y₆O₅F₈, Y₇O₆F₃, and Y₁₇O₁₄F₂₃. Among them, the species having molar ratios (O/RE and X/RE) in the favorable ranges such as Y₆O₅F₈ and Y₁₇O₁₄F₂₃ are preferable because they can lead to formation of a denser and harder thermal spray coating with great plasma erosion resistance.

In the yttrium oxyfluoride example, part or all of the yttrium (Y) and part or all of the fluorine (F) can be substituted with an arbitrary rare earth element and an arbitrary halogen, respectively, for the same or a similar crystal structure can be formed.

The rare earth element oxyhalide may be formed as: a single phase of a species described above; as a mixed phase, solid solution phase or compound of two or more species in combination; or as a mixture of these; and so on.

When the thermal spray material comprises rare earth element oxyhalides having a number (e.g. a number a; when a is a natural number, a ≧2) of different compositions, as for the molar ratios (X/RE and O/RE), the molar ratios (Xa/REa and Oa/REa) are determined for the respective compositions and multiplied by the abundance fractions of the respective compositions to obtain the overall molar ratios (X/RE and O/RE) for the entire rare earth element oxyhalide.

The molar ratios (X/RE and O/RE) of the rare earth element oxyhalide can be determined, for instance, based on its composition identified by X-ray diffraction analysis.

Specifically, the rare earth element oxyhalide content in the thermal spray material can be measured and determined by the following method. First, by X-ray diffraction analysis, the crystal structures of substances in the thermal spray material are identified. Here, with respect to the rare earth element oxyhalide, its atomicity (elemental ratio) is also determined.

For instance, when a species of rare earth element oxyhalide is present in the thermal spray material with the rest being YF₃, the oxygen content of the thermal spray material is measured by, for instance, an oxygen/nitrogen/hydrogen elemental analyzer (e.g. ONH836 available from LECO Corporation); from the resulting oxygen content, the rare earth element oxyhalide content can be quantified.

When two or more species of rare earth element oxyhalide are present or when an oxygen-containing compound such as yttrium oxide is mixed in, the fractions of the respective compounds can be quantified, for instance, by a calibration curve method. In particular, several samples varying in compositional ratio of the respective compounds are prepared; and the samples are individually analyzed by X-ray diffraction to plot calibration curves that show the relationship between the main peak intensity and the amounts of the respective compounds contained. Based on the calibration curves, their amounts contained are quantified based on the main peak intensity of the rare earth element oxyhalide in the XRD spectrum of the thermal spray material of interest.

Here, the rare earth element oxyhalide shows superior plasma erosion resistance to yttria (Y₂O₃) which is known as a highly plasma erosion resistant material. It is preferable that a larger amount of such a rare earth element oxyhalide is included because notably great plasma resistance can be exhibited.

Upon thermal spraying, the rare earth element oxide in a thermal spray material may remain unchanged as the rare earth element oxide in the resulting thermal spray coating. For instance, upon thermal spraying, yttrium oxide in the thermal spray material may remain unchanged as yttrium oxide in the resulting thermal spray coating. The rare earth element oxide (e.g. yttrium oxide) shows poorer plasma resistance as compared to that of a rare earth element oxyhalide. Thus, when exposed to a plasma environment, an area containing the rare earth element oxide is susceptible to formation of a brittle modified layer and the modified layer is likely to fall as fine particles. These fine particles may be deposited as particles on a semiconductor substrate. Thus, if any, the rare earth element oxide content as a possible particle source is preferably low.

In a preferable embodiment of the thermal spray material, the rare earth element oxyhalide content accounts for as high as or higher than 77% of the total mass.

As for such a rare earth element oxyhalide, even a small amount contributes to increasing the plasma erosion resistance, but it is preferable that a large amount of it is included as described above because notably great plasma resistance can be exhibited. The ratio of the rare earth element oxyhalide is more preferably 80% by mass or greater (above 80% by mass), yet more preferably 85% by mass or greater (above 85% by mass), even more preferably 90% by mass or greater (above 90% by mass), or yet even more preferably 95% by mass or greater (above 95% by mass). For instance, it is particularly favorable that it accounts for essentially 100% by mass (for all but inevitable impurities).

The rare earth element halide (typically a rare earth element fluoride) in a thermal spray material has even more superior plasma erosion resistance to the rare earth element oxide which is known as a highly plasma erosion resistant material. However, it can be oxidized by thermal spraying to form the corresponding rare earth element oxide in the resulting thermal coating. For instance, yttrium fluoride in the thermal spray material may be oxidized by thermal spraying to form yttrium oxide in the resulting thermal spray coating. The rare earth element oxide can form finer particle sources; and therefore, it is preferable that its content is low. In the art disclosed herein, the rare earth element halide can be included up to 23% of the total mass.

As described above, with respect to the rare earth element halide and rare earth element oxide which can easily become particle sources in a plasma environment, the lower their contents are in the thermal spray material, the more preferable it is. Yet more preferably, it is essentially free of the oxide and halide. In other words, it is particularly desirable that the thermal spray material essentially consists of the rare earth element oxyhalide.

The fact that a thermal spray material is “essentially free” of a certain component can be seen, for instance, by absence of detection of a diffraction peak corresponding to the component by XRD analysis. For instance, it can be found by absence of detection of diffraction peaks corresponding to a rare earth element halide and/or a rare earth element oxide.

The fact that a thermal spray material essentially consists of a rare earth element oxyhalide can be shown, for instance, by absence of detection of a diffraction peak corresponding to a compound that is not a rare earth element oxyhalide by XRD analysis.

In the art disclosed herein, the halogen plasma is typically generated, using a plasma-forming gas comprising a halogen gas (a gaseous halogen compound). In particular, typical examples include plasma formed with solely one species or a mixture of two or more species among fluorine-based gases such as SF₆, CF₄, CHF₃, ClF₃ and HF used in a dry etching step in manufacturing semiconductor substrates; chlorine-based gases such as Cl₂, BCl₃, and HCl; and bromine-based gases such as HBr. These gases can be used as a mixture with an inert gas such as argon (Ar).

The thermal spray material is typically provided in a powder form. Such a powder can be formed of particles prepared by granulation of finer primary particles or of a group of primary particles (which may include their aggregates). The upper limit of the average particle diameter is not particularly limited, either. The thermal spray material can have an average particle diameter of, for instance, 50 μm or smaller, preferably 40 μm or smaller, or more preferably about 35 μm or smaller. From the standpoint of the thermal spray efficiency, for instance, the average particle diameter is not particularly limited as long as it is about 30 μm or smaller. The lower limit of the average particle diameter is not particularly limited, either. In view of the fluidity of the thermal spray material, it can be, for instance, 5 μm or larger, preferably 10 μm or larger, or more preferably 15 μm or larger, for example, 20 μm or larger.

[Thermal Spray Coating]

By thermal spraying the thermal spray material described above, a thermal spray coating can be formed. When the thermal spray coating is on a surface of a substrate (base material), it is provided as a thermal sprayed article (member), etc. Such a thermal sprayed article and a thermal spray coating are described below.

(Substrate)

In the thermal sprayed article disclosed herein, the substrate on which the thermal spray coating is formed is not particularly limited. For instance, as long as the substrate is formed of a material having desirable resistance when subjected to thermal spraying of the thermal spray material, it is not particularly limited in terms of material, shape, etc. Examples of a material that constitutes such a substrate include various metallic materials such as metals, semimetals and alloys thereof as well as various inorganic materials. In particular, examples of metallic materials include metallic materials such as aluminum, aluminum alloy, iron, steel, copper, copper alloy, nickel, nickel alloy, gold, silver, bismuth, manganese, zinc and zinc alloy; and semi-metallic materials such as IV group semiconductors including silicon (Si) and germanium (Ge), II-VI group semiconductor compounds including zinc selenide (ZnSe), cadmium sulfide (CdS) and zinc oxide (ZnO), III-V group semiconductor compounds including gallium arsenide (GaAs), indium phosphide (InP) and gallium nitride (GaN), IV group semiconductor compounds including silicon carbide (SiC) and silicon germanium (SiGe), and chalcopyrite-based semiconductors including copper.indium.selenium (CuInSe₂). Examples of inorganic materials include circuit board materials such as calcium fluoride (CaF) and quartz (SiO₂), ceramic oxides such as alumina (Al₂O₃) and zirconia (ZrO₂), ceramic nitrides such as silicon nitride (Si₃N₄), boron nitride (BN) and titanium nitride (TiN), and ceramic carbides such as silicon carbide (SiC) and tungsten carbide (WC). The substrate can be constituted with one species of these materials or with a composite of two or more species. Among them, favorable examples include a substrate formed of a widely-used metallic material with a relatively large thermal expansion coefficient, such as steels typified by various SUS materials (possibly so-called stainless steels), heat-resistant alloys typified by Inconel, erosion-resistant alloys typified by Hastelloy, and aluminum alloys typified by 1000-series to 7000-series aluminum alloys useful as lightweight structural materials, etc. The substrate can be, for instance, a component that constitutes semiconductor device manufacturing equipment and is exposed to highly reactive oxygen gas plasma or halogen gas plasma. It is noted that, for convenience, silicon carbide (SiC) and the like can be classified into different categories as semiconductor compounds, inorganic materials, etc., but material-wise, they are the same.

(Thermal Spray Coating)

The thermal spray coating disclosed herein is formed by thermal spraying the thermal spray material to, for instance, an arbitrary substrate surface. Thus, the thermal spray coating is typically formed as a coating that comprises a rare earth element oxyhalide (RE-O—X), which comprises a rare earth element (RE), oxygen (O) and a halogen atom (X) as its elemental constituents. Since the rare earth element oxyhalide is the same as that in the thermal spray material, detailed description is omitted.

Although not necessarily limited to this, the thermal spray coating is characterized by the rare earth element oxyhalide having a halogen to rare earth element molar ratio (X/RE) of 1.1 or greater. The rare earth element oxyhalide in the thermal spray material can remain as is in the resulting thermal spray coating even when exposed to an oxygen atmosphere in a general thermal spray method.

In particular, with respect to the rare earth element oxyhalide with the molar ratio (X/RE) at or above 1.1, upon oxidation by thermal spray, at least part of it may remain unoxidized, thereby maintaining its composition and remaining in the resulting thermal spray coating. With respect to the rare earth element oxyhalide being oxidized, it can undergo a phase change to a rare earth element oxyhalide having a more stable composition; and therefore, it is unlikely to undergo direct oxidative decomposition to form the corresponding rare earth element oxide. For instance, upon oxidation during thermal spraying, the rare earth element oxyhalide in the thermal spray material may undergo a phase change to a rare earth element oxyhalide with a lower X/RE molar ratio (or a higher O/RE molar ratio) or to RE₁O₁X₁ (e.g. Y₁O₁F₁) and the like, which are considered thermodynamically stable. Furthermore, because the thermal spray material is thermally affected only for a very short time in a general thermal spray method, it is rare that all of the rare earth element oxyhalide with X/RE≧1.1 is oxidized to YOF. Accordingly, in typical, the thermal spray coating formed with the thermal spray material disclosed herein may at least partially comprise a rare earth element oxyhalide with the molar ratio (X/RE) at or above 1.1.

Although the detailed mechanism is unknown, a rare earth element oxyhalide with the molar ratio (X/RE) at or above 1.1 shows excellent erosion resistance to plasma, particularly to halogen plasma. Thus, the thermal spray coating comprising the rare earth element oxyhalide may exhibit notably great plasma erosion resistance.

As a more preferable embodiment, the thermal spray coating is also provided essentially free of an oxide of the rare earth element. The rare earth element oxide in the thermal spray coating can be typically a rare earth element oxide that has been in the thermal spray material and now is included unchanged in the thermal spray coating or a rare earth element oxide produced when a rare earth element halide that has been in the thermal spray material is oxidized upon thermal spraying. When a thermal spray coating is essentially free of a rare earth element oxide, the thermal spray material used for forming the thermal spray coating is also presumed to have been essentially free of a rare earth element oxide and a rare earth element halide. Rare earth element oxides are relatively hard, but are indeed brittle. Thus, when exposed to a plasma environment such as when followed by drying etching, they may give rise to particles. Because the thermal spray coating disclosed herein is essentially free of such a rare earth element oxide, it may show yet greater plasma erosion resistance.

Reduction of particles is demanded of dry etching equipment for manufacturing semiconductor devices. Possible causes of particle formation include falling of reaction products deposited in vacuum chambers as well as degradation of the chambers due to the use of halogen gas plasma or oxygen gas plasma. The larger the particle diameters are, the greater the problem is. In recent years with refined machining precision, it is necessary to strictly limit even the formation of particles having diameters of 0.2 μm or smaller (below 0.2 μm, e.g. 0.1 μm or smaller). Studies by the present inventors have shown that the number and sizes of particles formed from a thermal spray coating in a dry etching environment are greatly influenced by the composition of the thermal spray coating. For instance, with a conventional thermal spray coating, 0.2 μm or larger particles may occur, but by the use of the thermal spray material disclosed herein and proper thermal spraying operation, it is possible to obtain a thermal spray coating with excellent plasma erosion resistance. Typically, for instance, in current dry etching environments, the thermal spray coating disclosed herein will not form a modified layer that leads to formation of large particles larger than about 0.2 μm. This is because if the thermal spray coating disclosed herein is eroded in a dry etching environment, the particles occurring are formed from a modified layer formed of particles of about 0.2 μm or smaller (typically 0.1 μm or smaller). Thus, the thermal spray coating disclosed herein is less susceptible to the formation of particles of about 0.2 μm or smaller (e.g. 0.1 μm or smaller, typically 0.06 μm or smaller, preferably 19 nm or smaller, more preferably 5 nm or smaller, or most preferably 1 nm or smaller). For instance, the count of these particles is reduced to essentially zero.

Such plasma erosion resistance of a thermal spray coating can be evaluated, for instance, by the count of particles formed when the thermal spray coating is exposed to a certain plasma environment. In dry etching, an etching gas is introduced into a vacuum container (chamber) and by exciting the etching gas by high frequency, microwave, etc., to form plasma and generate radicals and ions. The radicals and ions generated in the plasma are allowed to react with a workpiece (wafer) subject to etching and the reaction products are eliminated as a volatile gas to the outside, whereby the workpiece is finely processed. For instance, in an actual parallel plate RIE (reactive ion etching) system, a pair of parallel plates is placed in the etching chamber. High frequency is applied to one of the electrodes to form plasma; a wafer is placed at the electrode and etching is carried out. The plasma is generated in a pressure range of about 10 mTorr or higher, but 200 mTorr or lower. As the etching gas, as described earlier, the possibilities include various halogen gases, oxygen gas and inert gases. When evaluating the plasma erosion resistance of a thermal spray coating, it is suitable to use a mixture of a halogen gas and oxygen gas (e.g. a mixture of argon, carbon tetrafluoride and oxygen at a certain volume ratio) as the etching gas. The flow rate of the etching gas is preferably, for instance, about 0.1 L/min or higher, but 2 L/min or lower.

After the thermal spray coating is stored in such a plasma environment for a certain time period (e.g. the time period required for processing 2000 semiconductor substrates (silicon wafers, etc.), the number of particles formed can be counted to favorably evaluate the plasma erosion resistance of the thermal spray coating. Here, to achieve a high level of quality control, for instance, particles of 0.06 μm or larger in diameter can be counted, but this can be suitably changed in accordance with the required quality. For example, regarding the particles in such a size range, plasma erosion resistance can be evaluated by means of counting the number of particles deposited per unit area of semiconductor substrate to determine the particle count (counts per cm²) and the like.

In a preferable embodiment of the thermal spray coating disclosed herein, the particle count can be reduced to at most about 15 counts per cm². For example, when particles are formed under the conditions specified below, the particle count can be 15 counts per cm² or less. Such an embodiment is preferable because the thermal spray coating can be obtained with surely increased plasma erosion resistance.

[Conditions for Particle Counting]

In a parallel plate plasma etching system, a 70 mm by 50 mm thermal spray coating is placed at the upper electrode. A 300 mm diameter substrate subject to plasma treatment is placed on the stage. To reproduce a state of the thermal spray coating after long-term use, a dummy run is conducted for a total of 100 hours where 2000 substrates (silicon wafers) are subjected to plasma dry etching. The conditions of the plasma formation are as follows: 13.3 Pa (100 mTorr) pressure, argon/carbon tetrafluoride/oxygen gas mixture as etching gas, and 13.56 MHz/4000 W applied power. Subsequently, a substrate (silicon wafer) for monitoring the measurement is placed on the stage and plasma is generated for 30 seconds under the same conditions as above. Before and after the plasma treatment, the number of 0.06 μm diameter or larger particles deposited on the substrate for measurement monitoring is counted. Here, for the evaluation, the product of dividing the particle count by the area of the substrate can also be used as the particle count (counts per cm²). For this, a gas mixture comprising argon, carbon tetrafluoride and oxygen can be used as the etching gas. The flow rate of the etching gas is, for instance, 1 L/min.

(Coating-Formation Method)

The thermal spray coating can be formed by supplying the thermal spray material disclosed herein to a thermal spray system based on a known thermal spray method. The favorable thermal spray method for the thermal spray material is not particularly limited. Favorable examples include plasma thermal spray method, high-velocity flame thermal spray method, flame thermal spray method, detonation thermal spray method and aerosol deposition method. The properties of a thermal spray coating may depend on the thermal spray method and its conditions to some degree. However, regardless of the thermal spray method and conditions employed, by using the thermal spray material disclosed herein, it is possible to form a thermal spray coating having superior plasma erosion resistance to that of thermal spray coatings formed of other thermal spray materials.

EXAMPLES

Several Examples related to the present invention are described below, but the present invention is not to be limited to these Examples.

Embodiment 1

As Thermal Spray Material No. 1, was obtained an yttrium oxide powder generally used as a protective coating on members in semiconductor device manufacturing equipment. As Thermal Spray Material No. 2, was obtained an yttrium fluoride powder being a rare earth element halide. An yttrium-containing compound and a fluorine-containing compound were suitably mixed and calcined to obtain Thermal Spray Materials Nos. 3 to 8 in powder forms. These thermal spray materials were tested for physical properties. The results are shown in Table 1. In Table 1, for reference, among the thermal spray materials disclosed in Patent Document 1, the data of thermal spray materials (Examples 5 and 6 in Patent Document 1) with relatively low counts of particles formed by plasma etching are also shown together as Comparative Examples A and B.

TABLE 1 XRD-detected phases of Relative intensities of XRD main peaks Molar thermal spray Y—O—F species ratio Oxygen No. material Y2O3 YF3 YOF Y7O6F9 Y6O5F8 Y5O4F7 X/RE (wt %) 1 Y2O3 100 0 0 0 0 0 — 21.3 2 YF3 0 100 0 0 0 0 — <0.1 3 YF3 0 45 100 0 0 0 1 10.1 YOF 4 YF3 0 11 100 0 0 0 1 11.6 YOF 5 YOF 0 0 100 0 0 0 1 12.9 6 Y7O6F9 0 0 0 100 0 0 1.29 10.0 7 Y6O5F8 0 0 0 0 100 0 1.33 10.5 8 Y5O4F7 0 0 0 0 0 100 1.40 12.5 A YF3 0 100 11 0 0 0 1 1.4 YOF B YF3 0 100 30 0 0 0 1 3.1 YOF Average Ratio of respective crystal phases (wt %) particle Fluorine Y—O—F species diameter No. (wt %) YF3 Y2O3 YOF Y7O6F9 Y6O5F8 Y5O4F7 (mm) 1 0 0 100 0 0 0 0 31 2 39.1 100 0 0 0 0 0 28 3 20.5 23 0 77 0 0 0 26 4 17.7 11 0 89 0 0 0 30 5 15.3 0 0 100 0 0 0 28 6 20.8 0 0 0 100 0 0 33 7 24.0 0 0 0 0 100 0 32 8 23.4 0 0 0 0 0 100 32 A — 89 0 11 0 0 0 — B — 76 0 24 0 0 0 —

In Table 1, the column headed “XRD-detected phases of thermal spray material” gives the crystal phases detected as a result of powder XRD analysis of each thermal spray material. In the same column, Y2O3 indicates detection of a phase formed of yttrium oxide, YF3 yttrium fluoride, Y5O4F7 an yttrium oxyfluoride represented by Y₅O₄F₇, Y6O5F8 an yttrium oxyfluoride represented by Y₆O₅F₈, Y7O6F9 an yttrium oxyfluoride represented by Y₇O₆F₉, and YOF an yttrium oxyfluoride represented by YOF (Y₁O₁F₁). The analysis was carried out using an XRD analyzer (ULTIMA IV available from Rigaku Corporation) with Cu Kα radiation (20 kV voltage, 10 mA current) as the X-ray source (scan rage 2θ=10° to 70°, scan speed 10°/min, sampling interval 0.01°). The divergence slit was adjusted to 1°, the divergence height-limiting slit to 10 mm, the scattering slit to 1/6°, the receiving slit to 0.15 mm, and the offset angle to 0°. For reference, the XRD spectra obtained with Thermal Spray Materials No. 5 and No. 8 are shown in FIGURE (a) and (b), respectively.

In Table 1, the column headed “Relative intensities of XRD main peaks” shows the intensities of the main peaks of the respective crystal phases detected in the diffraction pattern obtained with each thermal spray material by the powder XRD analysis, given as relative values with the highest main peak intensity being 100. For reference, the main peaks of the respective crystal phases are detected at 29.157° for Y₂O₃, 27.881° for YF₃, 28.064° for YOF, and 28.114° for Y₅O₄F₇.

In Table 1, the column headed “Molar ratio X/RE” shows the halogen to rare earth element molar ratio (X/RE) determined for the rare earth element oxyhalide among the crystal phases detected.

In Table 1, the columns headed “Oxygen” and “Fluorine” show the measurement results of the oxygen and fluorine contents of each thermal spray material, respectively. These oxygen and fluorine contents are the values measured with an oxygen/nitrogen/hydrogen elemental analyzer (ONH1836 available from LECO Corporation) and an automated fluorine ion analyzer (Model FLIA-101 available from Horiba, Ltd.), respectively.

In Table 1, the column headed “Ratio of respective crystal phases” gives the mass ratio of the respective crystal phases detected for each thermal spray material with the total of the crystal phases being 100% by mass, determined based on the relative intensity of the XRD main peak and the oxygen and fluorine contents.

In Table 1, the column headed “Average particle diameter” gives the average particle diameter of each thermal spray material. The average particle diameter is the D₅₀ value by weight measured with a laser diffraction/scattering particle size distribution analyzer (LA-300 available from Horiba, Ltd.).

(Evaluations)

The XRD analysis data has revealed that single yttrium oxyfluoride phases were obtained as Thermal Spray Materials Nos. 5 to 8. The results of the molar ratio in Table 1 show that the thermal spray material disclosed herein was obtained as Thermal Spray Materials Nos. 6 to 8.

Embodiment 2

By plasma thermal spraying of Thermal Spray Materials Nos. 1 to 8, thermal sprayed articles were fabricated, comprising thermal spray coatings of Nos. 1 to 8. The thermal spray was carried out under the conditions below.

In particular, as the substrate, a 70 mm by 50 mm by 2.3 mm plate of an aluminum alloy (Al6061) was obtained, blasted with a brown alumina abrasive (A#40) and used. The plasma thermal spray was carried out, using a commercial plasma spray gun (SG-100 available from Praxair Surface Technologies). Using argon gas at 50 psi (0.34 MPa) and helium gas at 50 psi (0.34 MPa) as the plasma gas, plasma was generated at 37.0 V voltage and 900 A current. The thermal spray materials were supplied with a powder feeder (Model 1264 available from Praxair Surface Technologies) to the thermal spray device at a rate of 20 g/min to form 200 μm thick thermal spray coatings. The feed rate of the spray gun was set to 24 m/min and spray distance to 90 mm.

The resulting thermal spray coatings were tested for physical properties. The results are shown in Table 2 below. The thermal spray coatings were exposed to halogen plasma and the particle counts were determined by the following three different methods. The results are shown in Table 2. Of the column headings for the data shown in Table 2, those in common with Table 1 give the results of subjecting the thermal spray coatings to the same tests.

TABLE 2 Crystal XRD- phases of detected thermal phases of Par- Par- Par- spray Molar thermal Relative intensities of XRD main peaks (—) Poros- Vickers ticle ticle ticle material ratio spray Y—O—F species ity hardness count count count No. (See Table 1) X/RE coating Y2O3 YF3 YOF Y7O6F9 Y6O5F8 Y5O4F7 (%) (Hv200 g) (1) (2) (3) 1 100% Y2O3 — Y2O3 100 0 0 0 0 0 12.5 450 E E E 2 100% YF3 — YF3 30 100 0 0 0 0 13.4 213 D D D Y2O3 3 22% YF3 1 YOF 65 0 100 0 0 0 14.3 214 D D D 78% YOF Y2O3 4 10% YF3 1 YOF 46 0 100 0 0 0 17.4 202 C C C 90% YOF Y2O3 5 100% YOF 1 YOF 41 0 100 0 0 0 11.7 291 C C C Y2O3 6 100% Y7O6F9 1.29 YOF 0 0 100 90 0 0 13.7 364 A A A Y7O6F9 7 100% Y6O5F8 1.33 YOF 0 0 100 0 85 0 11.4 352 A A A Y6O5F8 8 100% Y5O4F7 1.40 YOF 0 0 67 0 0 100 12.4 391 B B B Y5O4F7 A 89% YF3 1 — — — — — — — — — (3)^() D D 11% YOF B 76% Y2O3 1 — — — — — — — — — (2)^() D D 24% YOF

In Table 2, the column headed “Crystal phases of thermal spray material” gives the crystal phases constituting the respective thermal spray materials and their approximate ratio based on the ratio of the respective crystal phases determined in Embodiment 1 as well as their XRD analysis data.

In Table 2, the column headed “XRD-detected phases of thermal spray coating” gives the crystal phases detected as a result of powder XRD analysis of each thermal spray coating. In Table 2, Y6O5F8 refers to a phase formed of an yttrium oxyfluoride represented by Y₆O₅F₈ and Y7O6F9 an yttrium oxyfluoride represented by Y₇O₆F₉ while the others are the same as in Table 1. For reference, the main peak of Y₆O₅F₈ is detected at 28.139° and Y₇O₆F₉ at 28.137°.

In Table 2, the column headed “Porosity” shows the measurement result of the porosity of each thermal spray coating. The porosity measurement was carried out as follows: The thermal spray coating was cut across a plane orthogonal to the substrate surface; the resulting cross section was resin-filled and polished, and then an image of the cross section was taken with a digital microscope (VC-7700 available from Omron Corporation). The image was analyzed by image analysis software (IMAGE PRO available from Nippon Roper K. K) to identify pore areas in the cross section image. The ratio of the pore areas to the entire cross section was calculated to determine the porosity.

In Table 2, the column headed “Vickers harness” shows the measurement result of the Vickers hardness of each thermal spray coating. It refers to the Vickers hardness (HV 0.2) determined based on JIS R1610:2003, using a micro hardness tester (HMV-1 available from Shimadzu Corporation) with a test load of 1.96 N applied by a diamond indenter having an apical angle of 136°.

In Table 2, the column headed “Particle count (1)” gives the result of counting the number of particles formed when each thermal spray coating was exposed to plasma under the following conditions: The thermal spray coating surface of each thermal sprayed article fabricated above was first mirror-polished with colloidal silica with 0.06 μm in average particle diameter. The thermal sprayed article was placed on the part corresponding to the upper electrode in the chamber of parallel plate semiconductor manufacturing equipment so that the polished surface was exposed. A dummy run was carried out for 100 hours in which 2000 silicon wafers of 300 mm in diameter were placed on the stage in the chamber and subjected to plasma dry etching. The plasma used in the etching process was generated by applying 4000 W high frequency power at 13.56 MHz while keeping the pressure inside the chamber at 13.3 Pa and supplying, at a flow rate of 1 L/min, an etching gas containing argon, carbon tetrafluoride and oxygen at a prescribed ratio. Subsequently, on the stage inside the chamber, a silicon wafer of 300 mm in diameter for particle counting was placed and plasma was generated for 30 seconds under the same conditions as above. Upon this, the number of particles deposited from the thermal spray coating onto the silicon wafer for particle counting was counted. For the particle count, the total number of particles of 0.06 μm (60 nm) or larger in diameter was counted with a particle counter (wafer surface tester SURFSCAN SP2) available from KLA-Tencor Corporation. For the total particle count, particles on the silicon wafer were counted before and after the 30 second plasma etching and the difference was recorded as the count (total count) of particles that had been formed from the thermal spray coating after aged (after the dummy run) and deposited onto the silicon wafer. The particle count was graded by determining its relative value with the total particle count of the thermal spray coating of No. 1 formed of 100% yttria being 100 (reference).

In the column for Particle count (1), “A” is given when the particle count (relative value) was less than 1; “B” when 1 or greater, but less than 5; “C” when 5 or greater, but less than 15; “D” when 15 or greater, but less than 100; and “E” when 100 or greater.

The particle counts of the thermal spray coatings obtained from the materials of Comparative Examples A and B refer to the values of counting particles of about 0.2 μm or larger in particle diameter deposited on silicon wafer surfaces under the plasma etching conditions according to Patent Document 1.

In Table 2, the column headed “Particle count (2)” shows the particle count resulted when wafer surface tester SURFSCAN SP5 was used in place of SURFSCAN SP2 both available from KLA-Tenor Corporation. SURFSCAN SP5 can detect particles of 19 nm or larger in diameter. Particle count (2) shows the result when finer particles deposited on the silicon wafer were included in the count. For the total particle count, particles on the silicon wafer were counted before and after the 30 second plasma etching and the difference was recorded as the count (total count) of particles that had been formed from the thermal spray coating after aged and deposited onto the silicon wafer. The particle count was graded by determining its relative value with the total particle count of the thermal spray coating of No. 1 formed of 100% yttria being 100 (reference).

In the column for Particle count (2), “A” is given when the particle count (relative value) was less than 1; “B” when 1 or greater, but less than 5; “C” when 5 or greater, but less than 15; “D” when 15 or greater, but less than 100; and “E” when 100 or greater.

In Table 2, the column headed “Particle count (3)” shows the particle count when each thermal spray coating was irradiated with plasma under the conditions below and subjected to ultrasound to induce release of particles from the thermal spray coating.

In particular, in this example (test or experiment?), the coating surface of the thermal sprayed article obtained was mirror-polished and the thermal spray coating was covered at its four corners with masking tape to obtain a test piece with a 10 mm by 10 mm exposed thermal spray coating area. The test piece was placed at the upper electrode of the semiconductor device manufacturing equipment. While keeping the pressure inside the chamber at 13.3 Pa, an etching gas containing carbon tetrafluoride and oxygen at a prescribed ratio was supplied at a flow rate of 1 L/min, and 700 W high frequency power at 13.56 MHz was applied for a total of one hour to expose the test piece to plasma. Subsequently, air was supplied to the chamber and the thermal spray coating of the test piece after plasma exposure was subjected to ultrasound at 22 Hz at an output power of 400 W for 30 seconds to extricate particles from the thermal spray coating and particles in air were counted with a counter. For the particle count, the total number of particles of 100 nm or larger in diameter was counted, using a particle counter (LASAIR available from PMS). The result was graded by determining its relative value with the particle count of the thermal spray coating of No. 1 formed of 100% yttria being 100 (reference).

In the column for Particle count (3), “A” is given when the particle count (relative value) was less than 10; “B” when 10 or greater, but less than 25; “C” when 25 or greater, but less than 50; “D” when 50 or greater, but less than 90; and “E” when 90 or greater.

(Evaluations)

As evident from the results of No. 1 in Table 2, thermal spray coatings formed by thermal spraying of a thermal spray material made of solely Y₂O₃ essentially consist of Y₂O₃, showing no sign of further oxidative decomposition and the like of Y₂O₃ occurring during thermal spraying.

The results of Nos. 2 to 5 have revealed that with respect to a thermal spray coating formed by thermal spraying of a thermal spray material consisting of YF₃ or YOF or comprising a mixture phase of these, YF₃ or YOF is partially oxidized to Y₂O₃, whereby the thermal spray coating includes Y₂O₃. In particular, in the results of Nos. 3 and 4, 10% by mass of the YF₃ contained in the thermal spray material was completely oxidized to Y₂O₃. This shows that when YF₃ and YOF are present together in a thermal spray material, YOF is more stable to oxidation and YF₃ tends to be oxidized first.

According to the results of Nos. 5 to 8, among the yttrium oxyfluorides in thermal spray materials, species with molar ratios (X/RE) above 1.1—such as Y₇O₆F₉, Y₆O₅F₈ and Y₅O₄F₇—are oxidized by thermal spraying to the more stable YOF phase first, without directly forming Y₂O₃. It has been also found that thermal spray materials such as Nos. 6 to 8 do not form Y₂O₃ in the resulting thermal spray coating in a general atmospheric plasma spray method like the present embodiment.

Particle Count (1):

As for the physical properties of the thermal spray coatings, in the plasma environment from the thermal spray coating of No. 1 consisting solely of Y₂O₃, with (E)100 (reference) being the count of particles formed the particle counts per unit area of silicon wafer reached as many as about 500 to 1000 counts per wafer. In general, yttria-based thermal spray coatings are known to show superior plasma erosion resistance to that of alumina-based thermal spray coatings and the like. In this embodiment, however, the thermal spray coating formed of Y₂O₃ resulted in the highest particle count, exhibiting the poorest plasma resistance among all the thermal spray coatings.

With the thermal spray coating of No. 2, the count of particles formed in the plasma environment was (D) 15 or greater, but less than 100. The thermal spray coating of No. 2 has a relatively high ratio of Y₂O₃ formed by oxidation of YF₃ that had been in the thermal spray material. Thus, when exposed to fluorine plasma, it is likely to be altered to form a brittle modified layer. When exposed to a plasma environment in subsequent dry etching, it is likely to fall as particles to accumulate on a semiconductor substrate. Accordingly, it has been shown that the inclusion of Y₂O₃ in a thermal spray coating decreases the plasma erosion resistance.

It is noted that among the particles detected, about 90% or more were ultrafine particles (≧0.06 μm, <0.2 μm) which had never been heretofore subject to control.

With respect to the counts of particles formed from these thermal spray coatings in the plasma environment, No. 3 was comparable to No. 2; however, as for Nos. 4 and 5, with decreasing amount of Y₂O₃, the particle counts decreased to (C) less than 15. This suggests that YOF present in a thermal spray coating is extremely stable to plasma and effectively inhibits the plasma-caused peeling of the Y₂O₃-containing modified layer.

It is noted that, presumably, both YOF and Y₂O₃ are present in the thermal spray coatings obtained by thermal spraying the thermal spray materials of Comparative Examples A and B. In comparison of the particle counts between Comparative Examples A and B, even a slight increase in Y₂O₃ content of the thermal spray coating can greatly impair the plasma erosion resistance.

As shown with Nos. 6 to 8, it has become evident that, with respect to a thermal spray coating essentially consisting of an yttrium oxyfluoride and being free of YF₃ and Y₂O₃, the particle count can be reduced to a notably low level ((A) to (B), below 5). It can be said that these thermal spray coatings with well-balanced appropriate porosity and Vickers hardness are of good qualities. Also, with respect to these particles, almost all were ultrafine, having diameters of 0.06 μm or larger, but smaller than 0.2 μm.

It is noted that the thermal spray coatings of Nos. 6 and 7 formed with Y₇O₆F₉ and Y₆O₅F₈ as the thermal spray materials showed further superior plasma erosion resistance to the thermal spray coating of No. 8 formed with Y₅O₄F₇ as the thermal spray material. From the standpoint of the porosity, the thermal spray coating of No. 7 is considered more preferable.

From the above, it has been shown that, among the yttrium oxyfluorides in the thermal spray material, species with the molar ratio (X/RE) above 1.1—such as Y₇O₆F₉, Y₆O₅F₈ and Y₅O₄F₇—are less likely to form Y₂O₃ with inferior plasma resistance in the thermal spray material; and therefore, they can form thermal spray coatings with excellent plasma erosion resistance. With such a thermal spray coating, it is possible to minimize the formation of ultrafine particles of less than 0.2 μm which had never been subject to control. It has been also found that by forming a thermal spray coating with a thermal spray material having a molar ratio (X/RE) in a range of 1.1 or greater, but 1.39 or less (particularly in a range of greater than 1.29, but less than 1.4), the thermal spray coating can be preferably obtained with greatly improved properties which include porosity and Vickers hardness.

Particle Count (2):

As shown in Table 2, the particle count (2) results were well comparable to the particle count (1) results. Thus, it has been found that, with respect to a thermal spray coating formed by thermal spraying the thermal spray material disclosed herein, the particle count is relatively significantly decreased and even the formation of particles as fine as 19 nm to 60 nm in particular is reduced to a low level in comparison to the thermal spray coating of No. 1 formed of solely Y₂O₃. 19 nm or larger particles are the smallest particles that can be currently detected. In the results, such fine particles were almost nonexistent (close to zero). This confirms that the thermal spray coating produced from the thermal spray material disclosed herein still exhibits high plasma erosion resistance even when the lower particle detection limit is further improved.

Particle Count (3):

As shown in Table 2, the particle count (3) results agreed well with the results of the particle counts (1) and (2). However, the particles detected in the particle count (3) are relatively large particles of at least 100 nm and the thresholds for A to D are also set closer to E. In other words, according to the particle count (3), a greater amount of larger particles are formed due to the ultrasound shock waves and made available for detection. This suggests that according to the particle count (3), in addition to the particles directly formed by halogen plasma irradiation, it is even possible to assess particle sources from which particles have not been actually formed yet, but can be formed later on. The particle sources are of the modified thermal spray coating (modified layer) formed by halogen plasma irradiation and can be thought as portions that may form particles during subsequent plasma etching. This indicates that by subjecting to ultrasound a thermal spray coating that has been exposed to halogen plasma, the plasma erosion resistance of the thermal spray coating can be evaluated more accurately. The particle count (3) also allows predicting the occurrence of particles formed from the thermal spray coating, for instance, for a case where more than 2000 silicon wafers are processed. For instance, with respect to the thermal spray coatings of Nos. 6 to 8, the results of Table 2 show that the occurrence of particles when exposed to halogen plasma was reduced to a greater extent.

Although specific embodiments of the present invention have been described in detail above, these are merely for illustrations and do not limit the scope of claims. The art according to the claims includes various modifications and changes made to the specific embodiments illustrated above. 

What is claimed is:
 1. A thermal spray comprising: a rare earth element oxyhalide (RE-O—X) comprising a rare earth element (RE), oxygen (O) and a halogen atom (X) as its elemental constituents, the rare earth element oxyhalide having a molar ratio (X/RE) of the halogen to the rare earth element molar ratio of 1.1 or greater.
 2. The thermal spray material of claim 1, wherein the molar ratio (X/RE) of the halogen to the rare earth element is 1.3 or greater, but 1.39 or less.
 3. The thermal spray material of claim 1, further comprising: a rare earth element halide, with the rare earth element halide accounting for 23% or more of the total mass.
 4. The thermal spray material of claim 1 essentially free of a rare earth element halide.
 5. The thermal spray material of claim 1 essentially free of a rare earth element oxide
 6. The thermal spray material of claim 1, wherein the rare earth element is yttrium, the halogen is fluorine, and the rare earth element oxyhalide is an yttrium oxyfluoride.
 7. A thermal spray coating that is a thermal spray deposit of the thermal spray material of claim
 1. 8. A thermal spray coating comprising: a rare earth element oxyhalide (RE-O—X) comprising a rare earth element (RE), oxygen (O) and a halogen atom (X) as its elemental constituents, the rare earth element oxyhalide having a halogen to rare earth element molar ratio (X/RE) of 1.1 or greater.
 9. The thermal spray coating of claim 8 essentially free of the rare earth element oxide.
 10. The thermal spray coating of claim 8, wherein the rare earth element is yttrium, the halogen is fluorine, and the rare earth element oxyhalide is an yttrium oxyfluoride.
 11. A thermal sprayed article having a substrate surface provided with the thermal spray coating of claim
 7. 12. A thermal sprayed article having a substrate surface provided with the thermal spray coating of claim
 8. 